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Mist CVD of oxide materials for advanced semiconductor technologies - Assoc.Prof.NISHINAKA Hiroyuki, Electrical Engineering and Electronics

Assoc. Prof. Nishinaka uses everyday household items to deposit materials during semiconductor microfabrication. This CVD (chemical vapor deposition) method is something other researchers said was impossible. Not anymore! These simulations will contribute to new material design.

  • Target
    Bachelor, Master, Doctor, General, High school
  • Language
    Japanese
  • Start month
  • Length
    No setting
  • Delivery method
    Ondemand
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©Kyoto Institute of Technology.  Last Update 2025-03-07
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